Treatment system for removing phosphorus

ABSTRACT

A new method of forming mask ROM in the manufacture of an integrated circuit device has been achieved. A semiconductor substrate is provided with field oxide areas defined and a gate oxide layer overlying the semiconductor substrate. A gate electrode layer is deposited overlying the gate oxide layer. The gate electrode layer and the gate oxide layer are patterned to form gate electrodes. Ions are implanted to form source and drain junctions. A buffer layer is deposited overlying the gate electrodes, the source and drain junctions, and the field oxide areas. The buffer layer is etched down to expose the gate electrodes while leaving a protective thickness of the buffer layer overlying the source and drain junctions. Ions are implanted through the gate electrodes into the semiconductor substrate to selectively code the mask ROM devices and to complete the mask ROM devices in the manufacture of the semiconductor device. A coding mask controls the ion implantation to selectively code the mask ROM. The buffer layer prevents the ions from penetrating into the source and drain areas.

BACKGROUND OF THE INVENTION

(1) Field of the Invention

The invention relates to a method of fabricating semiconductor structures, and more particularly, to a method of forming mask read-only memory (ROM) devices in the manufacture of integrated circuit devices.

(2) Description of the Prior Art

Mask read-only memory (ROM) devices are memory arrays where the contents are permanently hard coded. Mask ROM is used, for example, for core or boot-up programming in microcomputer systems. Though the contents of the memory array cannot be altered, the mask ROM integrated circuit can be produced for less money than a comparably sized programmable device, such as electrically erasable programmable ROM (EEPROM). In addition, the data in a mask ROM is typically less prone to data errors resulting from programming problems or data loss due to environmental conditions.

The key technology in the mask ROM is typically the MOS transistor. Each cell in the mask ROM array is comprised of a MOS transistor. Each transistor has been pre-programmed to a given state during the manufacturing process. The state of the transistor, either logical “0” or “1,” is determined by the fixed threshold voltage of the transistor.

Referring now to FIG. 1, a cross sectional representation of a prior art integrated circuit device is illustrated. The cross section shows a partially completed mask ROM device of the prior art. A semiconductor substrate 10 is shown. Field oxide (FOX) regions 14 have been defined in the semiconductor substrate 10. The active device area for the mask ROM is the area of the substrate 10 between the field oxide regions 14. A sacrificial oxide layer 18 has been formed overlying the semiconductor substrate 10.

In the typical prior art process, a coding implantation 26 is performed at this part of the mask ROM process. In the coding implantation 26, doping ions are implanted into the semiconductor substrate 10 where defined by the coding mask 22. The coding implantation 26 will alter the voltage threshold (V_(t)) of the completed MOS transistor by creating a coding threshold region 30 near the surface of the semiconductor substrate 10 where the doping concentration is either greater or lesser than the comparable region in non-implanted devices.

A typical mask ROM scenario could be the assignment of a logical “1” to transistors with high V_(t) and a logical “0” to transistors with low V_(t). If the ion implantation used in the coding implant will cause the V_(t) to increase, then the mask used to pattern the photoresist 22 will have openings only overlying logical “1” transistors.

Referring now to FIG. 2, after the coding implantation, the sacrificial oxide layer 18 is removed. A gate oxide layer 32 is formed overlying the semiconductor substrate 10. A polysilicon layer 38 is deposited overlying the gate oxide layer 32. The polysilicon layer 38 and the gate oxide layer 32 are then patterned to form the gate electrode 38 for the mask ROM device. Additional processing steps for forming lightly doped drains, sidewall spacers , and source and drain junctions, would also occur but are not illustrated here.

Note that the coding implantation occurs relatively early in the mask ROM manufacturing sequence. This is an important observation. The data contents, often a microcomputer program, are permanently encoded into the mask ROM as soon as the coding implant is performed. If the designers of the mask ROM application require a programming change after the integrated circuit or circuit batch has passed the coding implantation, it is too late. The circuits either must be used as they were originally coded, or they must be scrapped. In practice, code changes are a common occurrence. Preferably, the coding process step would be as late in the processing sequence as possible. A relatively later coding step in the process helps to prevent scrap, provides better service to the applications customer, and increases the economic viability of the mask ROM manufacturer.

Several prior art approaches disclose methods to form mask ROM devices in the manufacture of an integrated circuit device. U.S. Pat. No. 5,378,647 to Hong discloses a method to form a mask ROM device using polysilicon bit lines and a back gate construction. The bit pattern is formed by selective removal of the polysilicon layer. U.S. Pat. No. 5,589,414 to Wann et al discloses a prior art method to code a mask ROM by selectively implanting the channel area through the polysilicon gate. Photoresist is used to protect non-implanted gates and source and drain regions. This invention also teaches a method to code a mask ROM where a thin first polysilicon gate layer is formed. The code implant is performed through the thin polysilicon gate. The second polysilicon layer is deposited, and the transistor is completed. U.S. Pat. No. 5,751,040 to Chen et al teaches a process to form a mask ROM device with a vertical channel. U.S. Pat. No. 5,831,314 to Wen discloses a process to form a trench-shaped ROM device.

SUMMARY OF THE INVENTION

A principal object of the present invention is to provide an effective and very manufacturable method of forming mask read-only memory (ROM) devices in the manufacture of integrated circuits.

A further object of the present invention is to provide a method to code mask ROM devices later in the processing sequence.

Another further object of the present invention is to provide a method to code mask ROM devices by ion implantation after formation of the gate electrode and the source and drain regions.

Another further object of the present invention is to protect the mask ROM source and drain regions with a buffer layer to prevent bit-line to bit-line code leakage due to the high energy ion implantation used in coding.

In accordance with the objects of this invention, a new method of forming mask ROM in the manufacture of an integrated circuit device has been achieved. A semiconductor substrate is provided with field oxide areas defined and a gate oxide layer overlying the semiconductor substrate. A gate electrode layer is deposited overlying the gate oxide layer. The gate electrode layer and the gate oxide layer are patterned to form gate electrodes. Ions are implanted to form source and drain junctions. A buffer layer is deposited overlying the gate electrodes, the source and drain junctions, and the field oxide areas. The buffer layer is etched down to expose the gate electrodes while leaving a protective thickness of the buffer layer overlying the source and drain junctions. Ions are implanted through the gate electrodes into the semiconductor substrate to selectively code the mask ROM devices and to complete the mask ROM devices in the manufacture of the semiconductor device. A coding mask controls the ion implantation to selectively code the mask ROM. The buffer layer prevents the ions from penetrating into the source and drain areas.

BRIEF DESCRIPTION OF THE DRAWINGS

In the accompanying drawings forming a material part of this description, there is shown:

FIGS. 1 and 2 schematically illustrate in cross-section a partially completed prior art integrated circuit device.

FIGS. 3 through 9 schematically illustrate in cross-section the preferred embodiment of the present invention.

DESCRIPTION OF THE PREFERRED EMBODIMENTS

The embodiment discloses the application of the present invention to the formation of mask ROM in the manufacture of an integrated circuit device. It should be clear to those experienced in the art that the present invention can be applied and extended without deviating from the scope of the present invention.

Referring now particularly to FIG. 3, there is shown a cross section of a partially completed integrated circuit device of the preferred embodiment. A semiconductor substrate 50, typically consisting of monocrystalline silicon, is provided. Field oxide areas 54 are defined in the semiconductor substrate 50. The areas between the field oxide areas 54 are the active areas of the devices. A gate oxide layer 58 is formed overlying the semiconductor substrate 50. The gate oxide layer 58 serves as the electrode dielectric for the subsequently formed mask ROM device. The gate oxide layer 58 is formed by a conventional process such as low-pressure chemical vapor deposition (LPCVD) or by thermal oxidation. The gate oxide layer 58 is preferably formed to a thickness of between about 100 Angstroms and 200 Angstroms.

An important feature of the present invention is the gate electrode layer 62. The gate electrode layer 62 is deposited overlying the gate oxide layer 58. The gate electrode layer 62 may comprise one of the group containing: polysilicon, polycide and silicide.

The thickness of the gate electrode layer 62 is a critical component in the present invention. The process of the present invention performs the coding ion implantation after the formation of the gate electrodes and the source and drain junctions. Therefore, the implanted ions must pass through the gate electrodes and into the underlying channel regions in the semiconductor substrate 50. As the thickness of the gate electrode layer 62 is increased, the energy required for the ion implantation also increases. Unfortunately, if the ion implantation energy is too great, the ions will also penetrate into unwanted areas and possibly cause junction leakage between bit-lines. Finally, if the gate electrode layer 62 is too thin, the resistivity of the gates will increase and cause a degradation of circuit performance. The gate electrode layer 62 preferably comprises polysilicon deposited by LPCVD to a thickness of between about 2,500 Angstroms and 3,500 Angstroms.

Referring now to FIG. 4, the gate electrode layer 62 and the gate oxide layer 58 are patterned to form gate electrodes and word lines 62 for the mask ROM device. The patterning is conventionally performed using a photolithographic sequence of coating with photoresist, exposing through a mask, developing, and etching.

Referring now to FIG. 5, the mask ROM device is depicted after implantation of lightly doped drains 66, formation of sidewall spacers 74, and implantation of source and drain junctions 70. The lightly doped drains 66 are conventionally implanted and are self-aligned to the gate electrodes 62. The sidewall spacers 74 may comprise silicon nitride or silicon dioxide. The sidewall spacers 74 are conventionally formed using a plasma sputter-deposition process. The source and drain junctions 70 are conventionally implanted and are self-aligned to the sidewall spacers 74.

Referring now to FIG. 6, an important feature of the present invention is illustrated. A buffer layer 78 is deposited overlying the gate electrodes 62, the source and drain junctions 70, and the field oxide areas 54. The buffer layer 78 will protect the source and drain junctions 70 during the subsequent coding ion implantation. The buffer layer 78 will prevent ion infiltration into unwanted areas of the circuit. The buffer layer 78 preferably comprises a bottom anti-reflective coating (BARC) that may be an organic material. The buffer layer 78 may also comprise a spin-on glass (SOG) material. The buffer layer 78 is preferably BARC deposited to a thickness of between about 1,000 Angstroms and 2,500 Angstroms.

Referring now to FIG. 7, another important part of the present invention is illustrated. The buffer layer 78 is etched down to expose the gate electrodes 62 while leaving a protective thickness of the buffer layer 78 overlying the source and drain junctions. The buffer layer 78 must be removed from the gate electrodes 62 so that it does not inhibit the implantation of ions through the gate electrode layer 62 during the code implantation. In addition, the etching down removes any oxide that may have formed over the gate electrode 62 and thus improves the implantation capability. Conversely, a significant thickness of the buffer layer 78 must be left overlying the source and drain junctions 70 in the semiconductor substrate 50 to protect and shield this part of the device from the implantation.

The etching down step is preferably performed using a dry etching process with an O₂ base. After the etching down step, a protective thickness of between about 700 Angstroms and 1,500 Angstroms of the buffer layer 78 is left overlying the source and drain junctions.

Referring now to FIG. 8, another important feature of the present invention is illustrated. Ions are implanted 86 through the gate electrodes 62 to code the mask ROM devices. The ion implantation 86 is performed in a selective fashion. A masking layer 82 of photoresist is used to block or permit passage of the ions into selected devices. The masking photoresist 82 is patterned, for example, using a photolithographic process that opens the photoresist 82 where selective mask ROM cells are to be implanted.

The implantation of the ions 86 through the gate electrode layer 62 forms an implanted region 90 under the gate electrode 62 in the channel region of the transistor. The presence of the implanted region alters the V_(t) of the transistor to the desired value for the code. For example, for N-code, phosphorous ions may be implanted at an energy of between 160 KeV and 180 KeV and a dosage of between about 1×10¹³ atoms/cm² and 5×10¹³ atoms/cm². For P-code, boron ions may be implanted at an energy of between about 100 KeV and 140 KeV and a dosage of between about 8×10¹³ atoms/cm² and 2×10¹⁴ atoms/cm².

The presence of the buffer layer 78 overlying the source and drain junctions 70 prevents ions from implanting into the semiconductor substrate 50 in the junctions and under the bird's beak area of the field oxide region 54. If ions were to implant in the bird's beak area, this would cause junction leakage and result in bit-line to bit-line leakage.

Referring now to FIG. 9, the buffer layer 78 is removed. A dielectric layer 94 is deposited conventionally to insulate the mask ROM device. After patterning contact openings, a metal layer 98 is deposited overlying the dielectric layer 94. The metal layer 98 is patterned to form desired connectivity and the mask ROM device is completed in the manufacture of the integrated circuit device.

Experimental data confirms the viability and effectiveness of the novel approach of the present invention for forming mask ROM devices. The prior art mask ROM process illustrated in FIGS. 1 and 2 performs the coding implant after the formation of the sacrificial oxide layer but before the formation of the gate electrodes and the source and drain junctions. This prior art process produces an exemplary yield of about 85%. By comparison, the preferred embodiment of the present invention produces a yield of about 74%. It is believed that fine-tuning the process of the invention will allow further yield improvement. In addition, the preferred embodiment of the present invention is found to postpones the critical coding implantation step ten days further into the processing cycle. This delay in coding allows the manufacturer to process material up to the coding operation and hold this material until it is needed by a customer with a final masking code design. The customer then will receive finished product ten days sooner. The manufacturer will also tend to scrap less product due to last minute code changes.

Finally, experimental material has been processed excluding the critical buffer layer. That is, the process of the present invention was performed without protecting the source and drain junctions during the coding implantation. The experimental yield of 0% confirms the need and effectiveness of the buffer layer. The high energy required to implant the channel area through the gate electrode causes a great deal of residual and undesirable implantation. The bit line to bit line leakage is too great to allow for any device yield.

As shown in the preferred embodiments, the present invention provides a very manufacturable process for forming mask ROM devices in an integrated circuit device. The application of the present invention in the preferred embodiments forms the mask ROM devices up to and including the gate electrodes and the source and drain junctions. The coding implantation is then selectively performed with a buffer layer overlying the source and drain junction to prevent unwanted ion implantation.

While the invention has been particularly shown and described with reference to the preferred embodiments thereof, it will be understood by those skilled in the art that various changes in form and details may be made without departing from the spirit and scope of the invention. 

What is claimed is:
 1. A method to form a mask read-only memory (ROM) device in the manufacture of an integrated circuit device comprising: providing a semiconductor substrate wherein field oxide areas are defined and wherein a gate oxide layer overlies said semiconductor substrate; depositing a gate electrode layer overlying said gate oxide layer; patterning said gate electrode layer and said gate oxide layer to form gate electrodes; thereafter implanting ions into said semiconductor substrate to thereby form source and drain junctions; thereafter depositing a buffer layer overlying said gate electrodes, said source and drain junctions, and said field oxide areas; etching down said buffer layer to expose said gate electrodes while leaving a protective thickness of said buffer layer overlying said source and drain junctions; and thereafter implanting ions through said gate electrodes into said semiconductor substrate to thereby selectively code said mask ROM devices and to complete said mask ROM devices in the manufacture of said semiconductor device, wherein a coding mask controls said implanting ions to selectively code and wherein said buffer layer prevents said ions from penetrating into said source and drain areas.
 2. The method according to claim 1 wherein said gate electrode layer comprises polysilicon.
 3. The method according to claim 1 wherein said gate electrode layer is deposited to a thickness of between about 2,500 Angstroms and 3,500 Angstroms.
 4. The method according to claim 1 wherein said buffer layer comprises one of the group of: bottom anti-reflective coating (BARC) and spin-on glass (SOG).
 5. The method according to claim 1 wherein said buffer layer is deposited to a thickness of between about 1,000 Angstroms and 2,500 Angstroms.
 6. The method according to claim 1 wherein said protective thickness of buffer layer after said step of etching down said buffer layer is between about 700 Angstroms and 1,500 Angstroms.
 7. The method according to claim 1 wherein said step of implanting ions through said gate electrodes comprises phosphorous ions implanted at an energy of between about 160 KeV and 180 KeV and a dose of between about 1×10¹³ ions/cm² and 5×10¹³ ions/cm².
 8. The method according to claim 1 wherein said step of implanting ions through said gate electrodes comprises boron ions implanted at an energy of between about 100 KeV and 140 KeV and a dose of between about 8×10¹³ ions/cm² and 2×10¹⁴ ions/cm².
 9. The method according to claim 1 further comprising: implanting ions into said semiconductor substrate to thereby form lightly doped drain junctions after said step of patterning said gate electrode layer and said gate oxide layer to form said gate electrodes; and thereafter forming sidewall spacers on said gate electrodes before said step of implanting ions to thereby form said source and drain junctions.
 10. A method to form a mask read-only memory (ROM) device in the manufacture of an integrated circuit device comprising: providing a semiconductor substrate wherein field oxide areas are defined and wherein a gate oxide layer overlies said semiconductor substrate; depositing a gate electrode layer overlying said gate oxide layer; patterning said gate electrode layer and said gate oxide layer to form gate electrodes; thereafter implanting ions into said semiconductor substrate to thereby form lightly doped drain junctions; thereafter forming sidewall spacers on said gate electrodes; thereafter implanting ions into said semiconductor substrate to thereby form source and drain junctions; thereafter depositing a buffer layer overlying said gate electrodes, said source and drain junctions, and said field oxide areas; etching down said buffer layer to expose said gate electrodes while leaving a protective thickness of said buffer layer overlying said source and drain junctions; and thereafter implanting ions through said gate electrodes into said semiconductor substrate to thereby selectively code said mask ROM devices and to complete said mask ROM devices in the manufacture of said semiconductor device, wherein a coding mask controls said implanting ions to selectively code and wherein said buffer layer prevents said ions from penetrating into said source and drain areas.
 11. The method according to claim 10 wherein said gate electrode layer comprises polysilicon.
 12. The method according to claim 10 wherein said gate electrode layer is deposited to a thickness of between about 2,500 Angstroms and 3,500 Angstroms.
 13. The method according to claim 10 wherein said buffer layer comprises one of the group of: bottom anti-reflective coating (BARC) and spin-on glass (SOG).
 14. The method according to claim 10 wherein said buffer layer is deposited to a thickness of between about 700 Angstroms and 1,500 Angstroms.
 15. The method according to claim 10 wherein said protective thickness of buffer layer after said step of etching down said buffer layer is between about 700 Angstroms and 1,500 Angstroms.
 16. The method according to claim 10 wherein said step of implanting ions through said gate electrodes comprises phosphorous ions implanted at an energy of between about 160 KeV and 180 KeV and a dose of between about 1×10¹³ ions/cm² and 5×10¹³ ions/cm².
 17. The method according to claim 10 wherein said step of implanting ions through said gate electrodes comprises boron ions implanted at an energy of between about 100 KeV and 140 KeV and a dose of between about 8×10¹³ ions/cm² and 2×10¹⁴ ions/cm².
 18. A method to form a mask read-only memory (ROM) device in the manufacture of an integrated circuit device comprising: providing a semiconductor substrate wherein field oxide areas are defined and wherein a gate oxide layer overlies said semiconductor substrate; depositing a polysilicon layer overlying said gate oxide layer; patterning said polysilicon layer and said gate oxide layer to form gate electrodes; thereafter implanting ions into said semiconductor substrate to thereby form lightly doped drain junctions; thereafter forming sidewall spacers on said gate electrodes; thereafter implanting ions into said semiconductor substrate to thereby form source and drain junctions; thereafter depositing a buffer layer overlying said gate electrodes, said source and drain junctions, and said field oxide areas wherein said buffer layer comprises a bottom anti-reflective coating (BARC); etching down said buffer layer to expose said gate electrodes while leaving a protective thickness of said buffer layer overlying said source and drain junctions; and thereafter implanting ions through said gate electrodes into said semiconductor substrate to thereby selectively code said mask ROM devices and to complete said mask ROM devices in the manufacture of said semiconductor device, wherein a coding mask controls said implanting ions to selectively code and wherein said buffer layer prevents said ions from penetrating into said source and drain areas.
 19. The method according to claim 18 wherein said polysilicon layer is deposited to a thickness of between about 2,500 Angstroms and 3,500 Angstroms.
 20. The method according to claim 18 wherein said protective thickness of buffer layer after said step of etching down said buffer layer is between about 700 Angstroms and 1,500 Angstroms. 